Single Manifold Dies

Single Manifold Dies2018-07-10T14:55:15+00:00

Single Manifold Dies

Proper design of an extrusion die is essential for successful coextrusion. The Cloeren Epoch™ Die Series features unique manifold geometries and a patented two-stage preland. This exclusive combination, together with custom engineering, provides unparalleled mass flow distribution across the die width, which increases process yield and quality of the finished product. The patented Epoch™ Die was the first commercially established extrusion die that addressed non-uniform die clamshelling. Both the Epoch™ III and Epoch™ V feature a two stage, non-linear preland that is optimized for uniform cross-direction flow distribution.

Epoch™ III
Cloeren’s coextrusion die designs feature low energy dissipation manifolds beneficial to individual layer uniformities across the die width, complementary to the feedblock coextrusion process.

Epoch™ V
Our custom design features a streamlined teardrop cross-section manifold suitable for mono-layer extrusions.

moebius-manifold™ Die
Cloeren’s newest innovation in die design, the patented moebius-manifold™ Die, provides a revolutionary solution that reduces residence time and clamshell deflection while increasing the processing window.

The moebius-manifold™ Die incorporates a varying manifold transition angle that provides a diminishing cross-sectional area manifold while maintaining Cloeren’s trademark straight-backline manifold design. The varying lead angle further enhances streamlining at the manifold ends where the flow rates are the lowest. This provides the latest enhancement for heat-sensitive and residence-time-sensitive polymers, such as PVC and fluoropolymers.

Uniquely, the moebius-manifold™ is suitable for Cloeren’s full cavity IDS™ Internal Deckle System.

emo™ Die
Cloeren purchased all remaining shares of the Austrian extrusion die company EMO GmbH in 2017. One of the results of this acquisition is the introduction of a non-linear die design in our product portfolio. The emo™ Die is suitable for monolayer structures.

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